Parameters of silicon carbide diode avalanche shapers for the picosecond range
- Авторы: Ivanov M.S.1, Rodin P.B.1, Ivanov P.A.1, Grekhov I.V.1
- 
							Учреждения: 
							- Ioffe Physical Technical Institute
 
- Выпуск: Том 42, № 1 (2016)
- Страницы: 43-46
- Раздел: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/196749
- DOI: https://doi.org/10.1134/S1063785016010090
- ID: 196749
Цитировать
Аннотация
Parameters of ultrafast avalanche switching of high-voltage diode structures based on 4H-SiC have been estimated theoretically. The calculation was carried out using the analytical theory of the impact ionization wave of the TRAPATT type, which makes it possible to determine the main characteristics of a wave for arbitrary dependences of the impact ionization coefficients and carrier drift velocity on electric field. It is shown that, for a high-voltage (1–10 kV) 4H-SiC structure, the time of switching from the blocking to the conducting state is ~10 ps, which is an order of magnitude shorter than that for a Si structure with the same stationary breakdown voltage, and the concentration of the electron-hole plasma created by the wave is two orders of magnitude higher. Picosecond switching times can be reached for 4H-SiC structures with a stationary breakdown voltage exceeding 10 kV.
Ключевые слова
Об авторах
M. Ivanov
Ioffe Physical Technical Institute
														Email: rodin@mail.ioffe.ru
				                					                																			                												                	Россия, 							St. Petersburg, 194021						
P. Rodin
Ioffe Physical Technical Institute
							Автор, ответственный за переписку.
							Email: rodin@mail.ioffe.ru
				                					                																			                												                	Россия, 							St. Petersburg, 194021						
P. Ivanov
Ioffe Physical Technical Institute
														Email: rodin@mail.ioffe.ru
				                					                																			                												                	Россия, 							St. Petersburg, 194021						
I. Grekhov
Ioffe Physical Technical Institute
														Email: rodin@mail.ioffe.ru
				                					                																			                												                	Россия, 							St. Petersburg, 194021						
Дополнительные файлы
 
				
			 
						 
						 
						 
					 
						 
									 
  
  
  
  
  Отправить статью по E-mail
			Отправить статью по E-mail  Открытый доступ
		                                Открытый доступ Доступ предоставлен
						Доступ предоставлен Только для подписчиков
		                                		                                        Только для подписчиков
		                                					