Influence of Annealing Temperature on the Microstructure and Morphology of TiN Films Synthesized by Dual Magnetron Sputtering
- 作者: Zaitsev S.1, Vashchilin V.1, Prokhorenkov D.1, Limarenko M.1, Evtushenko E.1
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隶属关系:
- Shukhov State Technological University
- 期: 卷 63, 编号 8 (2018)
- 页面: 1189-1193
- 栏目: Physics of Nanostructures
- URL: https://journals.rcsi.science/1063-7842/article/view/201846
- DOI: https://doi.org/10.1134/S1063784218080236
- ID: 201846
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详细
TiN films synthesized on leucosapphire substrates by dual magnetron sputtering have been annealed in vacuum at 600, 700, 800, and 900°C for 2 min. The microstructure and morphology of the films have been studied by X-ray diffraction and scanning electron microscopy at different temperatures. It has been found that annealing changes the microstructure, texture, grain size, and surface roughness of the TiN films.
作者简介
S. Zaitsev
Shukhov State Technological University
编辑信件的主要联系方式.
Email: sergey_za@mail.ru
俄罗斯联邦, Belgorod, 308012
V. Vashchilin
Shukhov State Technological University
Email: sergey_za@mail.ru
俄罗斯联邦, Belgorod, 308012
D. Prokhorenkov
Shukhov State Technological University
Email: sergey_za@mail.ru
俄罗斯联邦, Belgorod, 308012
M. Limarenko
Shukhov State Technological University
Email: sergey_za@mail.ru
俄罗斯联邦, Belgorod, 308012
E. Evtushenko
Shukhov State Technological University
Email: sergey_za@mail.ru
俄罗斯联邦, Belgorod, 308012