Influence of Annealing Temperature on the Microstructure and Morphology of TiN Films Synthesized by Dual Magnetron Sputtering

S. V. Zaitsev; V. S. Vashchilin; D. S. Prokhorenkov; M. V. Limarenko; E. I. Evtushenko

doi:10.1134/S1063784218080236

Influence of Annealing Temperature on the Microstructure and Morphology of TiN Films Synthesized by Dual Magnetron Sputtering

Autores: Zaitsev S.¹, Vashchilin V.¹, Prokhorenkov D.¹, Limarenko M.¹, Evtushenko E.¹
Afiliações:
1. Shukhov State Technological University
Edição: Volume 63, Nº 8 (2018)
Páginas: 1189-1193
Seção: Physics of Nanostructures
URL: https://journals.rcsi.science/1063-7842/article/view/201846
DOI: https://doi.org/10.1134/S1063784218080236
ID: 201846

Citar

Texto integral

Acesso aberto
Acesso é fechado

Acesso está concedido
Acesso é fechado

Somente assinantes

Resumo
Sobre autores
Bibliografia
Estatísticas

Resumo

TiN films synthesized on leucosapphire substrates by dual magnetron sputtering have been annealed in vacuum at 600, 700, 800, and 900°C for 2 min. The microstructure and morphology of the films have been studied by X-ray diffraction and scanning electron microscopy at different temperatures. It has been found that annealing changes the microstructure, texture, grain size, and surface roughness of the TiN films.