Microscopic Examination of the Silicon Surface Subjected to High-Dose Silver Implantation
- Authors: Vorob’ev V.V.1, Rogov A.M.1, Osin Y.N.1, Nuzhdin V.I.2, Valeev V.F.2, Eidel’man K.B.3, Tabachkova N.Y.3, Ermakov M.A.4, Stepanov A.L.1,2,5
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Affiliations:
- Interdisciplinary Center for Analytical Microscopy, Kazan Federal University
- Zavoiskii Physical Technical Institute, Kazan Scientific Center, Russian Academy of Sciences
- National University of Science and Technology MISIS
- Pacific National University
- Kazan National Research Technological University
- Issue: Vol 64, No 2 (2019)
- Pages: 195-202
- Section: Physical Science of Materials
- URL: https://journals.rcsi.science/1063-7842/article/view/202844
- DOI: https://doi.org/10.1134/S1063784219020270
- ID: 202844
Cite item
Abstract
Low-energy (E = 30 keV) Ag+ ions have been implanted into single-crystalline Si wafers (c-Si) with an implantation dose varying from 1.25 × 1015 to 1.5 × 1017 ions cm–2 and an ion beam current density varying from 2 to 15 μA/cm2. The surface morphology of implanted wafers has been examined using scanning electron microscopy, transmission electron microscopy, and atomic force microscopy, and their structure has been studied by means of reflection high-energy electron diffraction and elemental microanalysis. It has been shown that for minimal irradiation doses used in experiments, the surface layer of c-Si experiences amorphization. It has been found that when the implantation dose is in excess of the threshold value (~3.1 × 1015 ions cm–2), Ag nanoparticles uniformly distributed over the Si surface arise in the irradiated Si layer. At a dose exceeding 1017 ions cm–2, a porous Si structure is observed. In this case, the Ag nanoparticle size distribution becomes bimodal with coarse particles localized at the walls of Si pores.
About the authors
V. V. Vorob’ev
Interdisciplinary Center for Analytical Microscopy, Kazan Federal University
Author for correspondence.
Email: slavik.ksu@mail.ru
Russian Federation, Kazan, 420021 Tatarstan,
A. M. Rogov
Interdisciplinary Center for Analytical Microscopy, Kazan Federal University
Email: slavik.ksu@mail.ru
Russian Federation, Kazan, 420021 Tatarstan,
Yu. N. Osin
Interdisciplinary Center for Analytical Microscopy, Kazan Federal University
Email: slavik.ksu@mail.ru
Russian Federation, Kazan, 420021 Tatarstan,
V. I. Nuzhdin
Zavoiskii Physical Technical Institute, Kazan Scientific Center, Russian Academy of Sciences
Email: slavik.ksu@mail.ru
Russian Federation, Kazan, 420029 Tatarstan,
V. F. Valeev
Zavoiskii Physical Technical Institute, Kazan Scientific Center, Russian Academy of Sciences
Email: slavik.ksu@mail.ru
Russian Federation, Kazan, 420029 Tatarstan,
K. B. Eidel’man
National University of Science and Technology MISIS
Email: slavik.ksu@mail.ru
Russian Federation, Moscow, 119049
N. Yu. Tabachkova
National University of Science and Technology MISIS
Email: slavik.ksu@mail.ru
Russian Federation, Moscow, 119049
M. A. Ermakov
Pacific National University
Email: slavik.ksu@mail.ru
Russian Federation, Khabarovsk, 680035
A. L. Stepanov
Interdisciplinary Center for Analytical Microscopy, Kazan Federal University; Zavoiskii Physical Technical Institute, Kazan Scientific Center, Russian Academy of Sciences; Kazan National Research Technological University
Email: slavik.ksu@mail.ru
Russian Federation, Kazan, 420021 Tatarstan,; Kazan, 420029 Tatarstan,; Kazan, 420015 Tatarstan,