Deposition and Properties of thin TiOx Films Produced by Magnetron Sputtering of Ceramic Targets

Abstract

Thin TiO_x films were deposited on glass by magnetron sputtering of a preoxidized ceramic target at various flows of oxygen added to argon during sputtering. Oxygen flow level providing growth of a stoichiometric oxide coating was established. Stoichiometric oxide coatings demonstrated approximately 20% increase in visible transparency. Besides, adhesive sustainability and scratch resistance of coatings both increased more than twice in the stepwise way. Electrical resistance of the film surface demonstrated continuous growth with the increase of oxygen flow during the deposition. Parameters of the plasma discharge (operating voltage, current, and the power supply frequency) did not demonstrate any significant changes with variation of the oxygen inflow.