Gallium vacancy ordering in Ga2Se3 thin layers on Si(100), Si(111), and Si(123) substrates


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Thin Ga2Se3 layers deposited on silicon substrates with the (100), (111), and (123) orientations are studied by transmission electron microscopy and X-ray microanalysis. Some features and regularities of the stoichiometric gallium vacancy ordering at different substrate orientations are discussed. The Ga3Se4(100)с(2 × 2) and Ga2Se3(111)(√3 × √3)-R30° ordered structures are formed on the Si(100) and Si(111) surfaces, respectively.

作者简介

S. Kuzubov

Voronezh State Institute of Fire Defense

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Email: kuzub@land.ru
俄罗斯联邦, Voronezh, 394052

G. Kotov

Voronezh State University of Engineering Technologies

Email: kuzub@land.ru
俄罗斯联邦, Voronezh, 394000

Yu. Synorov

Voronezh State University of Engineering Technologies

Email: kuzub@land.ru
俄罗斯联邦, Voronezh, 394000

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