Structural Features and Mutual Influence of the Layers in PZT–LNO–SiOx–Si and PZT–LNO–Si Compositions
- Авторлар: Zhigalina O.M.1,2, Atanova A.V.1, Khmelenin D.N.1, Kotova N.M.3, Seregin D.S.3, Vorotilov K.A.3
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Мекемелер:
- Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,” Russian Academy of Sciences
- Bauman Moscow State Technical University
- Russian Technological University “MIREA”
- Шығарылым: Том 64, № 6 (2019)
- Беттер: 961-967
- Бөлім: Surface and Thin Films
- URL: https://journals.rcsi.science/1063-7745/article/view/194349
- DOI: https://doi.org/10.1134/S1063774519060282
- ID: 194349
Дәйексөз келтіру
Аннотация
The phase composition and specific features of the microstructures of layers in the Pb(Zr0.52Ti0.48)O3–LaNiO3–Si and Pb(Zr0.52Ti0.48)O3–LaNiO3–SiOx–Si compositions grown by chemical vapor deposition from solutions have been investigated by high-resolution transmission electron microscopy, electron diffraction, and energy-dispersive analysis. The influence of the structure of the lower LaNiO3 electrode on the structure and properties of ferroelectric lead zirconate titanate films with a perovskite structure is studied. It is shown that the misoriented porous polycrystalline structure of the lower electrode leads to violation of the columnarity of perovskite grains. The electrical parameters are slightly deteriorated in comparison with a conventional platinum electrode. The structures of the thin films with a silicate sublayer under the LaNiO3 electrode and without it are compared.
Авторлар туралы
O. Zhigalina
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”Russian Academy of Sciences; Bauman Moscow State Technical University
Хат алмасуға жауапты Автор.
Email: zhigal@crys.ras.ru
Ресей, Moscow, 119333; Moscow, 105005
A. Atanova
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”Russian Academy of Sciences
Email: zhigal@crys.ras.ru
Ресей, Moscow, 119333
D. Khmelenin
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”Russian Academy of Sciences
Email: zhigal@crys.ras.ru
Ресей, Moscow, 119333
N. Kotova
Russian Technological University “MIREA”
Email: zhigal@crys.ras.ru
Ресей, Moscow, 119454
D. Seregin
Russian Technological University “MIREA”
Email: zhigal@crys.ras.ru
Ресей, Moscow, 119454
K. Vorotilov
Russian Technological University “MIREA”
Email: zhigal@crys.ras.ru
Ресей, Moscow, 119454
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