Real structure of the ZnO epitaxial films on (0001) leucosapphire substrates coated by ultrathin gold layers


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Abstract

The real structure of ZnO films formed by magnetron sputtering on (0001) leucosapphire substrates coated by an ultrathin (less than 0.7 nm) Au buffer layer has been studied by high-resolution microscopy. It is shown that modification of the leucosapphire substrate surface by depositing ultrathin Au layers does not lead to the formation of Au clusters at the film–substrate interface but significantly improves the structural quality of ZnO epitaxial films. It is demonstrated that the simplicity and scalability of the technique used to modify the substrate surface in combination with a high (above 2 nm/s) film growth rate under magnetron sputtering make it possible to obtain high-quality (0001) ZnO epitaxial films with an area of 5–6 cm2.

About the authors

A. E. Muslimov

Shubnikov Institute of Crystallography

Author for correspondence.
Email: amuslimov@mail.ru
Russian Federation, Moscow, 119333

A. V. Butashin

Shubnikov Institute of Crystallography

Email: amuslimov@mail.ru
Russian Federation, Moscow, 119333

A. B. Kolymagin

Shubnikov Institute of Crystallography

Email: amuslimov@mail.ru
Russian Federation, Moscow, 119333

A. L. Vasilyev

Shubnikov Institute of Crystallography

Email: amuslimov@mail.ru
Russian Federation, Moscow, 119333

V. M. Kanevsky

Shubnikov Institute of Crystallography

Email: amuslimov@mail.ru
Russian Federation, Moscow, 119333


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