Molecular Beam Epitaxy of Si–Ge–Sn Heterostructures for Monolithically Integrated Optoelectronic Devices Based on Silicon


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Elastically strained metastable Ge1–xSnx layers with molar fractions of tin of up to 0.15 are grown on Si (001) substrates. To analyze the optical properties of the samples, photoluminescence (PL) spectra are measured at room temperature and IR transmission spectra are measured at the liquid helium temperature. The room temperature direct intrinsic absorption edge at 0.71–0.72 eV is visible in the spectra of the studied structures with tin contents of 12–13%.

作者简介

V. Martovitsky

Lebedev Physical Institute

Email: aklekovkinbox@gmail.com
俄罗斯联邦, Moscow, 119991

Yu. Aleshchenko

Lebedev Physical Institute; National Research Nuclear University MEPhI (Moscow Engineering Physics Institute)

Email: aklekovkinbox@gmail.com
俄罗斯联邦, Moscow, 119991; Moscow, 115409

V. Krivobok

Lebedev Physical Institute

Email: aklekovkinbox@gmail.com
俄罗斯联邦, Moscow, 119991

A. Muratov

Lebedev Physical Institute

Email: aklekovkinbox@gmail.com
俄罗斯联邦, Moscow, 119991

A. Klekovkin

Lebedev Physical Institute; Institute of Ultrahigh Frequency Semiconductor Electronics

编辑信件的主要联系方式.
Email: aklekovkinbox@gmail.com
俄罗斯联邦, Moscow, 119991; Moscow, 117105

A. Mehiya

Moscow Institute of Physics and Technology (State University)

Email: aklekovkinbox@gmail.com
俄罗斯联邦, Dolgoprudny, Moscow oblast, 141701

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