Effect of thermal treatment on the electrotransport properties of thin-film In2O3, ZnO materials and the multilayer (In2O3/ZnO)83 heterostructure

Resumo

The effect heat treatment has on the electrotransport mechanisms in films of ZnO and In2O3, and in a multilayer (In2O3/ZnO)83 structure obtained via ion-beam sputtering, is studied. It is shown that there is a mechanism of weak electron localization in the In2O3 and (In2O3/ZnO)83 samples. The relaxation processes that occur during the heat treatment of In2O3 films are found to increase the length of elastic electron scattering, but to reduce this parameter in multilayer heterostructures.

Sobre autores

I. Babkina

Voronezh State Technical University

Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

K. Gabriel’s

Voronezh State Technical University

Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

T. Epryntseva

Voronezh State Technical University

Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

O. Zhilova

Voronezh State Technical University

Autor responsável pela correspondência
Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

V. Makagonov

Voronezh State Technical University

Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

A. Sitnikov

Voronezh State Technical University

Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

P. Hlopovskikh

Voronezh State Technical University

Email: zhilova105@mail.ru
Rússia, Voronezh, 394026

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