Types of surface modulation in a Ge–Si(111) heterosystem
- 作者: Trukhanov E.M.1, Teys S.A.1
-
隶属关系:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- 期: 卷 80, 编号 6 (2016)
- 页面: 641-644
- 栏目: Proceedings of the Interdisciplinary Symposium “Ordering in Minerals and Alloys” OMA-18 and Proceedings of the International Interdisciplinary Symposium “Order, Disorder, and Properties of Oxides” ODPO-18
- URL: https://journals.rcsi.science/1062-8738/article/view/184453
- DOI: https://doi.org/10.3103/S106287381606037X
- ID: 184453
如何引用文章
详细
Three types of elastic modulation in atomic layers of epitaxial Ge films on the surface of Si(111) observed in scanning tunnel microscopy are discussed. Two types of modulation are associated with misfit dislocations accumulating at the interface. Modulation of the third type arises on the surfaces of dislocation-free pseudomorphic films and could be due to the presence on a Si substrate surface of two-dimensional silicon islands with a height of three atomic bilayers and lateral dimensions of 15–20 nm. Measured bending values Δh for the third type of modulation (Δh ≤ 0.1 nm) agree with data calculated within the theory of elasticity
作者简介
E. Trukhanov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
编辑信件的主要联系方式.
Email: trukh@isp.nsc.ru
俄罗斯联邦, Novosibirsk, 630090
S. Teys
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: trukh@isp.nsc.ru
俄罗斯联邦, Novosibirsk, 630090
补充文件
