Structural and optical studies of thin films of aluminum nitride grown via ion-plasma sputtering on gallium arsenide substrates with different orientations

Abstract

IR and UV spectroscopy is used to study the properties of nanostructured aluminum nitride films obtained via reactive ion-plasma sputtering on GaAs substrates with different orientations. Nanostructured thin (100–200 nm) films of cubic aluminum nitride with optical bandgaps of ~5 eV and refractive indices varying from 1.6 to 4.0 in the wavelength range of ~250 nm are fabricated. Growth on a misoriented GaAs(100) substrate (4° with respect to the [110] plane) makes it possible to synthesize AlN films with smaller grains and higher refractive indices (n ~ 4). It is shown that misoriented GaAs substrates allow us to control the morphology, surface composition, and optical functional characteristics of AlN/GaAs heterophase systems.