Plasma-facing surface estimation in the presence of oblique magnetic field

Аннотация

Useful analytical approximation formulas for the sheath electric potential profile in the presence of secondary electron emission in oblique magnetic field is suggested.The potential distributions calculated with the proposed model are in good agreement with the respective simulations perfomed with a combined PIC and Monte Carlo code ELECTRAN. The influence of the magnetic field inclination angle on the angular and energy distributions of ions incident on plasma-facing components (PFC) and thus on the effective sputtering yield is analyzed.