Formation and crystal structure of GaSb/GaP quantum dots


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Resumo

The atomic structure of GaSb/GaP quantum dots grown via molecular beam epitaxy on a (100) GaP surface at epitaxy temperatures of 420–470°C is investigated. It is established that, depending on morphology of the GaP growth surface, the deposition of 1 ML of GaSb leads to the formation of strained Ga(Sb, P)/GaP or fully relaxed GaSb/GaP quantum dots. The obtained heterostructures exhibit high photoluminescence efficiency.

Sobre autores

D. Abramkin

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Autor responsável pela correspondência
Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090

E. Emelyanov

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090

M. Putyato

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090

A. Gutakovskii

Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

A. Kozhukhov

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090

B. Semyagin

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090

V. Preobrazhenskii

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090

T. Shamirzaev

Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University

Email: demid@isp.nsc.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

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