Preparation of Hydrophobic Porous Silicon by Metal-Assisted Etching with Pd-Catalyst
- 作者: Volovlikova O.1, Gavrilov S.1, Silakov G.1, Zheleznyakova A.1, Dudin A.2
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隶属关系:
- National Research University “Moscow Institute of Electronic Technology”
- Institute of Nanotechnology and Microelectronics, Russian Academy of Sciences
- 期: 卷 55, 编号 12 (2019)
- 页面: 1186-1195
- 栏目: Article
- URL: https://journals.rcsi.science/1023-1935/article/view/191327
- DOI: https://doi.org/10.1134/S1023193519120188
- ID: 191327
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详细
The process of the porous silicon layer formation by metal-assisted etching of single-crystal Si with the resistivity of ρ = 0.01 Ω cm, coated with thin Pd-film up to 100 nm thick, in HF/H2O2/H2O solution is studied. The porous silicon is studied by scanning electron microscopy and gravimetric analysis. The dependence of the silicon dissolution rate on the HF concentration, in the presence and in the absence of the Pd-film, is investigated. The anodic current facilitating the Si dissolution in the HF solutions of different concentration is studied. By using sessile drop method, the porous silicon formed by the Pd-assisted anodic etching was shown to be superhydrophobic. The porous Si wetting angle reached 172°. The free surface energy for the porous layers and the water surface tension at the porous Si are calculated. The modified Si-surfaces may found their possible use in robotics.
作者简介
O. Volovlikova
National Research University “Moscow Institute of Electronic Technology”
编辑信件的主要联系方式.
Email: 5ilova87@gmail.com
俄罗斯联邦, ZelenogradMoscow, 124498
S. Gavrilov
National Research University “Moscow Institute of Electronic Technology”
Email: 5ilova87@gmail.com
俄罗斯联邦, ZelenogradMoscow, 124498
G. Silakov
National Research University “Moscow Institute of Electronic Technology”
Email: 5ilova87@gmail.com
俄罗斯联邦, ZelenogradMoscow, 124498
A. Zheleznyakova
National Research University “Moscow Institute of Electronic Technology”
Email: 5ilova87@gmail.com
俄罗斯联邦, ZelenogradMoscow, 124498
A. Dudin
Institute of Nanotechnology and Microelectronics, Russian Academy of Sciences
Email: 5ilova87@gmail.com
俄罗斯联邦, Moscow, 119991