Structural and electrical properties of nickel–iron thin film on copper substrate for dynamic random access memory applications
- Authors: Saeed A.1, Ruthramurthy B.1, Yong W.H.1, Hoong O.B.2, Ban T.K.3, Kwang Y.H.4, Sreekantan S.5
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							Affiliations: 
							- Faculty of Engineering
- Nanotechnology and Catalysis Research Centre (NANOCAT)
- Department of Chemistry, Faculty of Science
- Department of Electrical and Electronic Engineering, Lee Kong Chian Faculty of Engineering and Science
- School of Materials & Mineral Resources Engineering, Engineering Campus
 
- Issue: Vol 52, No 8 (2016)
- Pages: 788-795
- Section: Article
- URL: https://journals.rcsi.science/1023-1935/article/view/188101
- DOI: https://doi.org/10.1134/S1023193516040121
- ID: 188101
Cite item
Abstract
Using pulse electrodeposition technique, nano crystalline NiFe films were deposited on conductive copper substrates, under galvanostatic mode in an ultrasonic field at different conditions such as pulse current magnitude, deposition time and ultrasonic bath temperature. As-prepared NiFe/Cu thin films were characterized for phase analysis, surface morphology, surface roughness and resistivity measurements. The results show that the use of ultrasonic bath at room temperature has reduced the surface roughness, resistivity, average grain size and crystallite size of NiFe/Cu thin films. The resistivity is reduced with increasing deposition current from 44.2 µΩ cm at 40 mA to 33.0 µΩ cm at 100 mA. On the other hand, a significant drop of the resistivity from 35.7 to 9.4 µΩ cm is observed if the deposition time was reduced from 5 to 3 min.
About the authors
Ayad Saeed
Faculty of Engineering
														Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Cyberjaya, Selangor, 63100						
Balachandran Ruthramurthy
Faculty of Engineering
							Author for correspondence.
							Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Cyberjaya, Selangor, 63100						
Wong Hin Yong
Faculty of Engineering
														Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Cyberjaya, Selangor, 63100						
Ong Boon Hoong
Nanotechnology and Catalysis Research Centre (NANOCAT)
														Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Kuala Lumpur, 50603						
Tan Kar Ban
Department of Chemistry, Faculty of Science
														Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Serdang, 43400						
Yow Ho Kwang
Department of Electrical and Electronic Engineering, Lee Kong Chian Faculty of Engineering and Science
														Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Bandar Sungai Long, Cheras, Selangor Darul Ehsan, 4300						
Srimala Sreekantan
School of Materials & Mineral Resources Engineering, Engineering Campus
														Email: balachandran.ruthramurthy@mmu.edu.my
				                					                																			                												                	Malaysia, 							Penang, 14300						
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