Obtaining Ceramic Based on Si3N4 and TiN by Spark Plasma Sintering
- Авторлар: Evdokimov A.A.1, Sivkov A.A.1, Gerasimov D.Y.1
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Мекемелер:
- National Research Tomsk Polytechnical University (FGAOU VONI TPU)
- Шығарылым: Том 72, № 9-10 (2016)
- Беттер: 381-386
- Бөлім: Article
- URL: https://journals.rcsi.science/0361-7610/article/view/244551
- DOI: https://doi.org/10.1007/s10717-016-9794-y
- ID: 244551
Дәйексөз келтіру
Аннотация
The dependences of the microstructure and physical-mechanical properties of Si3N4–TiN-based ceramic in a wide range of mass ratios of the components are examined. The sintering process and the accompanying physical and chemical processes, viz. the dependence of the hardness and density of the material on the ratios of the conducting phase of titanium nitride and the dielectric phase of silicon nitride with values above and below the percolation threshold, are examined. A ceramic based on pure titanium nitride with high physical-mechanical characteristics (H = 21.5 GPa) is obtained.
Авторлар туралы
A. Evdokimov
National Research Tomsk Polytechnical University (FGAOU VONI TPU)
Хат алмасуға жауапты Автор.
Email: kraamis@gmail.com
Ресей, Tomsk
A. Sivkov
National Research Tomsk Polytechnical University (FGAOU VONI TPU)
Email: kraamis@gmail.com
Ресей, Tomsk
D. Gerasimov
National Research Tomsk Polytechnical University (FGAOU VONI TPU)
Email: kraamis@gmail.com
Ресей, Tomsk
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