Surface Morphology of Various Matrixes with Zirconium Oxide Coatings Synthetized by Alternating Pulsing of Zirconium(IV) tert-Butoxide and Water Vapors Treatment of the Surface

Мұқаба

Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

Zirconium oxide coatings of various thicknesses were synthesized on the surface of plates of monocrystalline silicon and borosilicate glass by alternating pulsing of zirconium(IV) tert-butoxide and water vapors treatment. The effect of the matrix type and the coating thickness on surface morphology of the samples was investigated using atomic force microscopy. The concentrations of zirconium in the synthesis products were determined by X-ray spectral microanalysis and the growth constant of the zirconium oxide film on silicon was evaluated. Assumptions are made about the influence of the type of the matrix on the structure of the surface of the zirconium oxide layer.

Толық мәтін

Рұқсат жабық

Авторлар туралы

A. Moskalev

St. Petersburg State Institute of Technology (Technical University)

Хат алмасуға жауапты Автор.
Email: alexmosk2015@gmail.com
Ресей, St. Petersburg

V. Antipov

St. Petersburg State Institute of Technology (Technical University)

Email: alexmosk2015@gmail.com
Ресей, St. Petersburg

A. Tsipanova

St. Petersburg State Institute of Technology (Technical University)

Email: alexmosk2015@gmail.com
ORCID iD: 0000-0002-3510-5051
Ресей, St. Petersburg

A. Malygin

St. Petersburg State Institute of Technology (Technical University)

Email: alexmosk2015@gmail.com
ORCID iD: 0000-0002-1818-7761
Ресей, St. Petersburg

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2. Fig. 1. Dependence of zirconium content (a) and thickness (b) of zirconium-oxide film on silicon surface on the number of processing cycles

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3. Fig. 2. AFM reconstruction of the surface of initial silicon (a) and borosilicate glass (b) substrates in topography (left) and phase contrast (right) modes

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4. Fig. 3. AFM surface reconstruction of silicon (a) and borosilicate glass (b) samples after 10 processing cycles in topography (left) and phase contrast (right) modes

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5. Fig. 4. AFM surface reconstruction of silicon (a) and borosilicate glass (b) matrices after 130 processing cycles in topography (left) and phase contrast (right) mode

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6. Fig. 5. AFM reconstruction of the surface of borosilicate glass matrices after 260 cycles of processing in topography (a) and phase contrast (b) modes

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7. Fig. 6. AFM reconstruction of the surface of silicon (a) and borosilicate glass (b) matrices after 390 processing cycles in topography (left) and phase contrast (right) modes. Scanning area - 0.5×0.5 μm2

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8. Fig. 7. AFM reconstruction of the borosilicate glass matrix surface after 1000 processing cycles in topography (a) and phase contrast mode (b)

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9. Fig. 8. AFM reconstruction of the initial surface (a) and lateral surface of sapphire optical fiber after 390 processing cycles in topography (left) and phase contrast (right) modes

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10. Fig. 9. Schematic diagram of the flow-vacuum-type molecular layering unit

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