Study of MoO3 and TixMoyOz thin films obtained by atomic layer deposition

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Abstract

This work demonstrates ex situ characterization of molybdenum oxide (MoO3) and titanium–molybdenum oxide (TixMoyOz) thin films obtained at 150°C by atomic layer deposition using titanium tetrachloride (TiCl4), molybdenum oxotetrachloride (MoOCl4) and water. Atomic layer deposition of TixMoyOz was carried out using supercycles consisting of TiCl4/H2O and MoOCl4/H2O subcycles. Two types of TixMoyOz films were obtained in this work, where the ratio of subcycles was 1 : 1 (1Ti1MoO) and 1 : 7 (1Ti7MoO). The film growth rate was determined by spectroscopic ellipsometry and X-Ray reflectometry. The density and root-mean-square roughness of the films were also determined by X-Ray reflectometry. The composition of the films was determined by X-Ray photoelectron spectroscopy and found that the degree of oxidation of molybdenum in the MoO3 and 1Ti7MoO films was +6, and in the 1Ti1MoO film, molybdenum was found in the oxidation state of +5 and +6. X-Ray diffraction analysis showed that the films had an amorphous structure.

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About the authors

A. M. Maksumova

Dagestan State University

Email: ilmutdina@gmail.com
Russian Federation, Makhachkala, 367000

I. S. Bodalyov

St. Petersburg State Institute of Technology

Email: ilmutdina@gmail.com
Russian Federation, Saint Petersburg, 190013

I. M. Abdulagatov

Dagestan State University

Author for correspondence.
Email: ilmutdina@gmail.com
Russian Federation, Makhachkala, 367000

M. Kh. Rabadanov

Dagestan State University

Email: ilmutdina@gmail.com
Russian Federation, Makhachkala, 367000

A. I. Abdulagatov

Dagestan State University

Email: ilmutdina@gmail.com
Russian Federation, Makhachkala, 367000

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Supplementary files

Supplementary Files
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2. Fig. 1. SE data on the dependence of the thickness of MoO3 films on the number of ALD cycles on seed Al2O3.

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3. Fig. 2. SE data on the dependence of the thickness of TixMoyОz films on the number of ALD supercycles on seed Al2O3.

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4. Fig. 3. High-resolution XPS spectrum of the Mo3d line with models for the MoO3 film obtained at 150 °C using MoOCl4 and H2O.

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5. Fig. 4. High-resolution XPS spectrum of the Mo 3d line with models for films: a - 1Ti1MoO and b - 1Ti7MoO, obtained at 150°C.

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6. Fig. 5. Proposed scheme for bond formation by the donor-acceptor mechanism in TixMoyOz films with molybdenum reduction.

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