Structure and Phase Composition of Sputtered Films of Hafnium–Carbon Alloys

Аннотация

Ion-plasma sputtering and codeposition of ultrafine particles of hafnium and carbon were used to produce film coatings in the concentration ranges of 5.3–59.8 at % C. Structural investigations revealed the existence of Hf–C solid solutions in the concentration range of 5.3–11.5 at % C. In the concentration range of 21.5–59.8 at % C, the coatings consist of the hafnium-carbide phase; and at 16.2 at % C, both phases coexist. The lattice parameters of the phases present in the films and their variation depending on the carbon concentration have been determined. The dependence of the HfС lattice parameter in the range of 16.2–35.0 at % C on the nature of the substrate on which the coating is deposited has been established. The solid solutions of carbon in hafnium exhibit conductivity of metallic type; the resistance of the hafnium carbide almost does not change upon cooling from 300 to 11 K. The direct synthesis of hafnium carbide HfC by a codeposition of nanoparticles on the surface of products can be used as a technological method.