Effect of О+ Ion Implantation on the Composition and Chemical Structure of Nanosized Surface Layers of a Copper–Nickel Alloy Cu50Ni50

Abstract

This paper presents the results of our investigation into the effects of О⁺ and Ar⁺ ion implantation and alternating implantation of Ar⁺ and О⁺ ions on the composition of nanoscale surface layers of a 50Cu–50Ni alloy. Our study showed that at the selected parameters of О⁺ ion irradiation, the formation of nanoscale surface layers of the investigated alloy depends on the chemical affinity of oxygen atoms to the alloy components rather than on the processes of radiation nature accompanying the irradiation. This paper analyzes the possible segregation processes of the alloy components under conditions of О⁺ and Ar⁺ ion irradiation.