Light-emitting AlGaAs/GaAs diodes based on ingaas strain-compensated quantum wells with minimized internal losses OF 940 nm radiation absorption

封面

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

IR light-emitting diodes based on InGaAs/AlGaAs multiple quantum wells and AlxGa1–xAsyP1–y-layers that compensate stresses in the active region have been developed. The optical losses caused by absorption of radiation generated by the active region (λ = 940 nm) were studied at different doping levels of n-GaAs substrates. It has been shown that reducing the donor doping level from 4 × 1018 to 5 × × 1017 cm–3 gives an increase in the quantum efficiency of LEDs by ~ 30%. A technology that eliminates optical losses caused by absorption during radiation output has been developed. By removing the growth substrate and transferring the device structure to a carrier substrate with the formation of a rear metal reflector, LEDs were created that demonstrate a twofold increase in external quantum efficiency and efficiency (~ 40%) compared to the technology of outputting radiation through an n-GaAs substrate.

作者简介

R. Salii

Ioffe Institute

编辑信件的主要联系方式.
Email: r.saliy@mail.ioffe.ru
俄罗斯联邦, St. Petersburg

A. Malevskaya

Ioffe Institute

Email: r.saliy@mail.ioffe.ru
俄罗斯联邦, St. Petersburg

D. Malevskii

Ioffe Institute

Email: r.saliy@mail.ioffe.ru
俄罗斯联邦, St. Petersburg

S. Mintairov

Ioffe Institute

Email: r.saliy@mail.ioffe.ru
俄罗斯联邦, St. Petersburg

A. Nadtochiy

Ioffe Institute

Email: r.saliy@mail.ioffe.ru
俄罗斯联邦, St. Petersburg

N. Kalyuzhnyy

Ioffe Institute

Email: r.saliy@mail.ioffe.ru
俄罗斯联邦, St. Petersburg

参考

  1. Vasilopoulou M., Fakharuddin A., Pelayo García de Arquer F. et al. // Nat. Photon. 2021. V. 15. P. 656. https://doi.org/10.1038/s41566-021-00855-2
  2. Lee H.-J., Park G.-H., So J.-S. et al. // Infrared Phys. Technol. 2021. V. 118. https://doi.org/10.1016/j.infrared.2021.103879
  3. Entropa A.G., Vasenev A. // Energy Proc. 2017. V. 132. P. 63. https://doi.org/10.1016/j.egypro.2017.09.636
  4. Kitabayashi H., Ishihara K., Kawabata Y. et al. // SEI Tech. Rev. 2010. V. 72. P. 71.
  5. Infrared Illumination for Time-of-Flight Applications. 2008. https://lumileds.com/wp-content/uploads/files/WP35.pdf
  6. Kim D.K., Lee H.J., Won-Chan An. et al. // J. Korean Phys. Soc. 2018. V. 72. № 9. P. 1020. https://doi.org/10.3938/jkps.72.1020
  7. Lin Hl., Zeng Xh., Shi Sm. et al. // Optoelectron. Lett. 2019. V. 15. № 2. P. 113. https://doi.org/10.1007/s11801-019-8113-6
  8. Peng Bai P., Zhang Y., Wang T. et al. // Semicond. Sci. Technol. 2020. V. 35. № 3. P. 035021. https://doi.org/10.1088/1361-6641/ab6dbf
  9. Shubert E.F. Light-Emitting Diodes (second edition). Cambridge University Press, 2006. https://doi.org/10.1017/CBO9780511790546
  10. Малевская А.В., Калюжный Н.А., Малевский Д.А. и др. // Физика и техника полупроводников. 2021. Т. 55. № 8. С. 699. https://doi.org/10.21883/FTP.2021.08.51143.9665
  11. Kim S.-D., Lee H., Harris J.S.J. // Electrochem. Soc. 1995. V. 142. № 5. P. 1667. https://doi.org/10.1149/1.2048636
  12. Yu Y., Qin X., Huang B. et al. // Vacuum. 2003. V. 69. P. 489. https://doi.org/10.1016/S0042-207X(02)00560-2
  13. Kim D.-K., Lee H.-J. // J. Nanosci. Nanotechnol. 2018. V. 18. № 3. P. 2014. https://doi.org/10.1166/jnn.2018.14952
  14. Xu D.P., D’Souza M., Shin J.C. et al. // J. Cryst. Growth. 2008. V. 310. P. 2370. https://doi.org/10.1016/j.jcrysgro.2007.11.218
  15. Moss T.S., Burrell G.J., Ellis B. Semiconductor Opto-Electronic. Butterworth & Co. Ltd, 1973. https://doi.org/10.1016/C2013-0-04197-7
  16. Pankove J.I. Optical processes in semiconductors. Prentice-Hall. Inc., 1971.
  17. Urbach F. // Phys. Rev. 1953. V. 92. P. 1324. https://doi.org/10.1103/PhysRev.92.1324
  18. Casey H.C., Sell D.D., Wecht K.W. // J. Appl. Phys. 1975. V. 46. № 1. P. 250. https://doi.org/10.1063/1.321330
  19. Гуревич С.А., Федорович А.Е., Федоров А.В. // Физика и техника полупроводников. 1991. Т. 5. С. 769.
  20. Abroug S., Saadallah F., Yacoubi N. // Eur. Phys. J. Spec. Top. 2008. V. 153. P. 29. https://doi.org/10.1140/epjst/e2008-00386-7
  21. Малевская А.В., Калюжный Н.А., Малевский Д.А. и др. // Физика и техника полупроводников. 2021. Т. 55. № 7. С. 614. https://doi.org/10.21883/FTP.2021.07.51028.9646
  22. Ahn S.-C., Lee B.-T., An W.-C. et al. // J. Korean Phys. Soc. 2016. V. 69. № 1. P. 91. https://doi.org/10.3938/jkps.69.91
  23. Малевская А.В., Калюжный Н.А., Минтаиров С.А. и др. // Физика и техника полупроводников. 2021. Т. 55. № 12. С. 1218. https://doi.org/10.21883/FTP.2021.12.51709.9711
  24. Tzou A.-J., Lin B.-Ch., Lee Ch.-Y. et al. // J. Photon. Energy. 2015. V. 5. P. 057604–14. https://doi.org/10.1117/1.JPE.5.057604
  25. Малевская А.В., Калюжный Н.А., Солдатенков Ф.Ю. и др. // ЖТФ. 2023. Т. 93. № 1. С. 170. https://doi.org/10.21883/JTF.2023.01.54078.166-22
  26. Bailey C.G., Hubbard S.M., Forbes D.V. et al. // Appl. Phys. Lett. 2009. V. 95. № 20. P. 203110. https://doi.org/10.1063/1.3264967
  27. Van de Walle C.G. // Phys. Rev. 1989. V. 39. № 3. P. 1871. https://doi.org/10.1103/PhysRevB.39.1871
  28. Rudinsky M.E., Karpov S. Yu., Lipsanen H. et al. // Mat. Phys. Mechanics. 2015. V. 24. № 3. P. 278. https://doi.org/10.1134/S1063782613090054
  29. Redaelli L., Mukhtarova A., Valdueza-Felip S. et al. // Appl. Phys. Lett. 2014. V. 105. № 13. P. 131105. https://doi.org/10.1063/1.4896679
  30. Ekins-Daukes N.J., Kawaguchi K., Zhang J. // Cryst. Growth Des. 2002. V. 2. № 4. P. 287. https://doi.org/10.1021/cg025502y
  31. An W.-C., Kim H.-G., Kwac L.-K. et al. // J. Nanosci. Nanotechnol. 2019. V. 19. P. 2224. https://doi.org/10.1166/jnn.2019.15974
  32. Cho J., Schubert E.F., Kim J.K. // Laser Photon. Rev. 2013. V. 7. № 3. P. 408. https://doi.org/10.1002/lpor.201200025
  33. Fu H., Zhao Y. Nitride Semiconductor Light-Emitting Diodes (LEDs) (Second Edition). Elsevier Ltd, 2018. https://doi.org/10.1016/B978-0-08-101942-9.00009-5

版权所有 © Russian Academy of Sciences, 2024
##common.cookie##