电邮这篇文章 Near-fild optical lithography in application to plasmonic antennas characterization
- 作者: Shelaev A.V.1, Dorozhkin P.S.1,2, Bykov V.A.1
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隶属关系:
- NT-MDT Co., build. 317-A
- Skolkovo Institute of Science and Technology
- 期: 卷 59, 编号 6 (2016)
- 页面: 837-841
- 栏目: Laboratory Techniques
- URL: https://journals.rcsi.science/0020-4412/article/view/159396
- DOI: https://doi.org/10.1134/S0020441216050134
- ID: 159396
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详细
Proposed a method of measurements for both electrical field enhancement and size of near-field localization area for plasmonic antenna-probe. The method is based on optical modification of photosensitive sample. Shown the results of the proposed method and subdiffraction resolution of test image is demonstrated.
作者简介
A. Shelaev
NT-MDT Co., build. 317-A
编辑信件的主要联系方式.
Email: shelaev@ntmdt.ru
俄罗斯联邦, Zelenograd, Moscow, 124482
P. Dorozhkin
NT-MDT Co., build. 317-A; Skolkovo Institute of Science and Technology
Email: shelaev@ntmdt.ru
俄罗斯联邦, Zelenograd, Moscow, 124482; ul. Nobelya 3, Moscow, 143026
V. Bykov
NT-MDT Co., build. 317-A
Email: shelaev@ntmdt.ru
俄罗斯联邦, Zelenograd, Moscow, 124482
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