A silicon field-effect hall sensor with an extended operating temperature range


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The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.

Sobre autores

A. Leonov

Institute of Microelectronics Technology and High Purity Materials

Email: mord36@mail.ru
Rússia, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432

A. Malykh

Institute of Microelectronics Technology and High Purity Materials

Email: mord36@mail.ru
Rússia, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432

V. Mordkovich

Institute of Microelectronics Technology and High Purity Materials

Autor responsável pela correspondência
Email: mord36@mail.ru
Rússia, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432

M. Pavlyuk

JSC ICC Milandr

Email: mord36@mail.ru
Rússia, Georgievskii pr. 5, Zelenograd, Moscow, 124498

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