An Impulsive High-Pressure Gas Valve for Plasma Devices
- 作者: Staltsov V.V.1, Chebotarev V.V.1, Kulik N.V.1, Makhlaj V.A.1
-
隶属关系:
- Institute of Plasma Physics, National Science Center Kharkiv Institute of Physics and Technology, National Academy of Sciences of Ukraine
- 期: 卷 61, 编号 6 (2018)
- 页面: 878-881
- 栏目: Laboratory Techniques
- URL: https://journals.rcsi.science/0020-4412/article/view/160499
- DOI: https://doi.org/10.1134/S002044121806012X
- ID: 160499
如何引用文章
详细
An impulsive gas valve with an electrodynamic drive of the locking element is described. The valve is designed to inject working gases into a discharge channel of plasma devices of the compression and acceleration types. The key gas-dynamic and electrical characteristics of the impulsive gas valve are presented. The valve is capable of forming gas pulses with a wide range of gas-dynamic parameters: the supplied volume of the working gas is 30–540 cm3 per pulse (at atmospheric pressure) and the gas pressure in the flow is as high as 760 Torr.
作者简介
V. Staltsov
Institute of Plasma Physics, National Science Center Kharkiv Institute of Physics and Technology,National Academy of Sciences of Ukraine
编辑信件的主要联系方式.
Email: staltsov@ipp.kharkov.ua
乌克兰, Kharkiv, 61108
V. Chebotarev
Institute of Plasma Physics, National Science Center Kharkiv Institute of Physics and Technology,National Academy of Sciences of Ukraine
Email: staltsov@ipp.kharkov.ua
乌克兰, Kharkiv, 61108
N. Kulik
Institute of Plasma Physics, National Science Center Kharkiv Institute of Physics and Technology,National Academy of Sciences of Ukraine
Email: staltsov@ipp.kharkov.ua
乌克兰, Kharkiv, 61108
V. Makhlaj
Institute of Plasma Physics, National Science Center Kharkiv Institute of Physics and Technology,National Academy of Sciences of Ukraine
Email: staltsov@ipp.kharkov.ua
乌克兰, Kharkiv, 61108
补充文件
