Thermal training of functional surfaces fabricated with femtosecond laser pulses
- Authors: Romashevskiy S.A.1,2, Agranat M.B.1, Dmitriev A.S.2
- 
							Affiliations: 
							- Joint Institute for High Temperatures of the Russian Academy of Sciences
- National Research University “Moscow Power Engineering Institute”
 
- Issue: Vol 54, No 3 (2016)
- Pages: 461-465
- Section: Short Communications
- URL: https://journals.rcsi.science/0018-151X/article/view/156825
- DOI: https://doi.org/10.1134/S0018151X16030251
- ID: 156825
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Abstract
The effect of thermal training of a functional surface fabricated by means of femtosecond laser surface processing on a crystalline silicon (c-Si) surface is found for the first time. Hydrodynamic and thermal properties of the c-Si surface are revealed to be considerably modified by femtosecond laser processing and follow-up thermal training. The carried out experimental studies of wetting, evaporation, and boiling processes on the thermal trained laser processed surface open up ample opportunities in creation of tailored functional surfaces for micro/optoelectronic devices and power engineering applications.
About the authors
S. A. Romashevskiy
Joint Institute for High Temperatures of the Russian Academy of Sciences; National Research University “Moscow Power Engineering Institute”
							Author for correspondence.
							Email: sa.romashevskiy@gmail.com
				                					                																			                												                	Russian Federation, 							Moscow, 125412; Moscow, 111250						
M. B. Agranat
Joint Institute for High Temperatures of the Russian Academy of Sciences
														Email: sa.romashevskiy@gmail.com
				                					                																			                												                	Russian Federation, 							Moscow, 125412						
A. S. Dmitriev
National Research University “Moscow Power Engineering Institute”
														Email: sa.romashevskiy@gmail.com
				                					                																			                												                	Russian Federation, 							Moscow, 111250						
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