Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition
- Авторы: Shayapov V.R.1, Rumyantsev Y.M.1, Plyusnin P.E.1
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Учреждения:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch
- Выпуск: Том 50, № 3 (2016)
- Страницы: 213-218
- Раздел: Plasma Chemistry
- URL: https://journals.rcsi.science/0018-1439/article/view/156970
- DOI: https://doi.org/10.1134/S0018143916030127
- ID: 156970
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Аннотация
Relationships between the chemical composition of the gas phase and the properties of SiCxNyHz films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition have been studied. The plasma composition has been examined by optical emission spectroscopy. Thermal analysis of the films with simultaneous mass spectrometric detection of released gases has been performed. On the basis of the results and published data, mechanisms for the formation of films by plasma polymerization have been proposed and the film growth at a low plasma power and high reactor temperatures has been found to follow the heterogeneous mechanism.
Об авторах
V. Shayapov
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Автор, ответственный за переписку.
Email: shayapov@niic.nsc.ru
Россия, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
Yu. Rumyantsev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: shayapov@niic.nsc.ru
Россия, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
P. Plyusnin
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: shayapov@niic.nsc.ru
Россия, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
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