Email this article Chemical composition and properties of films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition
- Authors: Shayapov V.R.1, Rumyantsev Y.M.1, Plyusnin P.E.1
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Affiliations:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch
- Issue: Vol 50, No 3 (2016)
- Pages: 213-218
- Section: Plasma Chemistry
- URL: https://journals.rcsi.science/0018-1439/article/view/156970
- DOI: https://doi.org/10.1134/S0018143916030127
- ID: 156970
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Abstract
Relationships between the chemical composition of the gas phase and the properties of SiCxNyHz films produced from hexamethyldisilazane by plasma-enhanced chemical vapor deposition have been studied. The plasma composition has been examined by optical emission spectroscopy. Thermal analysis of the films with simultaneous mass spectrometric detection of released gases has been performed. On the basis of the results and published data, mechanisms for the formation of films by plasma polymerization have been proposed and the film growth at a low plasma power and high reactor temperatures has been found to follow the heterogeneous mechanism.
About the authors
V. R. Shayapov
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Author for correspondence.
Email: shayapov@niic.nsc.ru
Russian Federation, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
Yu. M. Rumyantsev
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: shayapov@niic.nsc.ru
Russian Federation, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
P. E. Plyusnin
Nikolaev Institute of Inorganic Chemistry, Siberian Branch
Email: shayapov@niic.nsc.ru
Russian Federation, pr. Akademika Lavrent’eva 3, Novosibirsk, 630090
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