Polyphenol derivatives of porphyrins containing fluorene units: Synthesis and positive-tone photoresists for 22-nanometer lithography
- Authors: Vainer A.Y.1, Dyumaev K.M.1, Kovalenko A.M.1, Babuskin Y.L.1, Krichevskaya S.A.1, Lubenskii G.R.1
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Affiliations:
- All-Russia Institute of Medicinal and Aromatic Plants
- Issue: Vol 468, No 2 (2016)
- Pages: 174-178
- Section: Chemistry
- URL: https://journals.rcsi.science/0012-5008/article/view/153690
- DOI: https://doi.org/10.1134/S0012500816060045
- ID: 153690
Cite item
Abstract
A new strategy was proposed for the synthesis of polyphenol derivatives of fluorene-containing porphyrins to be used as the base for positive-tone photoresists for lithography with exposure at 13.5 nm wavelength, which allow fabrication of microchips with a size of down to 22 nm. Polyphenols based on fluorenecontaining porphyrins were synthesized for the first time. It was shown that these polyphenol derivatives can be used to obtain positive-tone photoresists with a resolution of 22 nm.
About the authors
A. Ya. Vainer
All-Russia Institute of Medicinal and Aromatic Plants
Author for correspondence.
Email: nvbarannik@mail.ru
Russian Federation, ul. Grina 7, Moscow, 113628
K. M. Dyumaev
All-Russia Institute of Medicinal and Aromatic Plants
Email: nvbarannik@mail.ru
Russian Federation, ul. Grina 7, Moscow, 113628
A. M. Kovalenko
All-Russia Institute of Medicinal and Aromatic Plants
Email: nvbarannik@mail.ru
Russian Federation, ul. Grina 7, Moscow, 113628
Ya. L. Babuskin
All-Russia Institute of Medicinal and Aromatic Plants
Email: nvbarannik@mail.ru
Russian Federation, ul. Grina 7, Moscow, 113628
S. A. Krichevskaya
All-Russia Institute of Medicinal and Aromatic Plants
Email: nvbarannik@mail.ru
Russian Federation, ul. Grina 7, Moscow, 113628
G. R. Lubenskii
All-Russia Institute of Medicinal and Aromatic Plants
Email: nvbarannik@mail.ru
Russian Federation, ul. Grina 7, Moscow, 113628