Expansion of the spectral sensitivity range of the silicon photocells by growing a solid (Si2)1–x(GaP)x (0 ≤ x ≤ 1) solution

Resumo

The article concerns the growth of a hetero-epitaxial GaP layer on a silicon substrate via a buffer layer containing a continuous solid substitutional solution (Si₂)_1–x(GaP)_x (0 ≤ x ≤ 1) from the liquid phase. Epitaxial films grown under 950–830°С have n-type conductivity and specific resistance of ~0.01 Ohm•cm. The thickness of epitaxial films is 10–15 μm. The spectral sensitivity of the pSi-n(Si₂)_1–x(GaP)_x (0 ≤ x ≤ 1) heterostructure, which allows expanding the region of the spectral sensitivity of silicon photoreceivers and photocells, is studied.