A Vacancy Model of Pore Annihilation During Hot Isostatic Pressing of Single Crystals of Nickel-Base Superalloys

A. I. Epishin; B. S. Bokstein; I. L. Svetlov; B. Fedelich; T. Feldmann; Y. Le Bouar; A. Ruffini; A. Finel; B. Viguier; D. Poquillon

doi:10.1134/S2075113318010100

A Vacancy Model of Pore Annihilation During Hot Isostatic Pressing of Single Crystals of Nickel-Base Superalloys

作者: Epishin A.I.¹, Bokstein B.S.², Svetlov I.L.³, Fedelich B.⁴, Feldmann T.⁴, Le Bouar Y.⁵, Ruffini A.⁵, Finel A.⁵, Viguier B.⁶, Poquillon D.⁶
隶属关系:
1. Technical University of Berlin
2. National Technological University MISiS
3. All-Russian Scientific Research Institute of Aviation Materials
4. Federal Institute for Materials Research and Testing
5. Laboratory of Microstructure Studies and Mechanics of Materials
6. University of Toulouse
期: 卷 9, 编号 1 (2018)
页面: 57-65
栏目: Article
URL: https://journals.rcsi.science/2075-1133/article/view/207098
DOI: https://doi.org/10.1134/S2075113318010100
ID: 207098

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An improved diffusion model of pore annihilation during hot isostatic pressing of single crystals of nickel-base superalloys is proposed. The model considers dissolution of pores by emission of vacancies and their diffusion sink to low-angle boundaries. The calculation, which takes into account pore size distribution, predicts the kinetics of pore annihilation similar to experimental one.