Stability of Electrical Characteristics of MOS Structures Based on Gallium Oxide
- Авторлар: Kalygina V.M.1, Petrova Y.S.1, Prudaev I.A.1, Tolbanov O.P.1
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Мекемелер:
- National Research Tomsk State University
- Шығарылым: Том 59, № 6 (2016)
- Беттер: 757-761
- Бөлім: Physics of Semiconductors and Dielectrics
- URL: https://journals.rcsi.science/1064-8887/article/view/237288
- DOI: https://doi.org/10.1007/s11182-016-0833-5
- ID: 237288
Дәйексөз келтіру
Аннотация
We present the results of studying the capacitance-voltage and conductance-voltage characteristics of the GaxOy/GaAs-based metal – oxide – semiconductor structures obtained by thermal evaporation. Influence of the annealing temperature on the characteristics of the structures is established. It is found that at long-term storage in the room atmosphere, the structures do not change their properties, which is manifested in the stability of electrical characteristics.
Авторлар туралы
V. Kalygina
National Research Tomsk State University
Хат алмасуға жауапты Автор.
Email: kalygina@ngs.ru
Ресей, Tomsk
Yu. Petrova
National Research Tomsk State University
Email: kalygina@ngs.ru
Ресей, Tomsk
I. Prudaev
National Research Tomsk State University
Email: kalygina@ngs.ru
Ресей, Tomsk
O. Tolbanov
National Research Tomsk State University
Email: kalygina@ngs.ru
Ресей, Tomsk
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