Growth Simulation and Structure Analysis of Obliquely Deposited Thin Films
- Авторлар: Belyaev B.A.1,2,3, Izotov A.V.1,2, Solovev P.N.1
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Мекемелер:
- L. V. Kirensky Institute of Physics of the Siberian Branch of the Russian Academy of Sciences
- Siberian Federal University
- Siberian State Aerospace University Named after Academician M. F. Reshetnev
- Шығарылым: Том 59, № 2 (2016)
- Беттер: 301-307
- Бөлім: Article
- URL: https://journals.rcsi.science/1064-8887/article/view/237046
- DOI: https://doi.org/10.1007/s11182-016-0771-2
- ID: 237046
Дәйексөз келтіру
Аннотация
Based on the Monte Carlo method, a model of growth of thin films prepared by oblique angle deposition of particles is constructed. The morphology of structures synthesized by simulation is analyzed. To study the character of distribution of microstructural elements (columns) in the film plane, the autocorrelation function of the microstructure and the fast Fourier transform are used. It is shown that with increasing angle of particle incidence, the film density monotonically decreases; in this case, anisotropy arises and monotonically increases in the cross sections of columns, and the anisotropy of distribution of columns in the substrate plane also increases.
Негізгі сөздер
Авторлар туралы
B. Belyaev
L. V. Kirensky Institute of Physics of the Siberian Branch of the Russian Academy of Sciences; Siberian Federal University; Siberian State Aerospace University Named after Academician M. F. Reshetnev
Хат алмасуға жауапты Автор.
Email: belyaev@iph.krasn.ru
Ресей, Krasnoyarsk; Krasnoyarsk; Krasnoyarsk
A. Izotov
L. V. Kirensky Institute of Physics of the Siberian Branch of the Russian Academy of Sciences; Siberian Federal University
Email: belyaev@iph.krasn.ru
Ресей, Krasnoyarsk; Krasnoyarsk
P. Solovev
L. V. Kirensky Institute of Physics of the Siberian Branch of the Russian Academy of Sciences
Email: belyaev@iph.krasn.ru
Ресей, Krasnoyarsk
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