Charge Carrier Transport and Deep Levels Recharge in Avalanche S-Diodes Based on GaAs


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Carrier transport and deep-level recharging in semiconductor avalanche S-diode structures have been investigated. Gallium-arsenide n+–π–ν–n structures with the diffusion distribution of deep iron acceptors have been studied. It has been found by solving the continuity and Poisson equations with the use of a commercial software that the electron injection affects the avalanche breakdown voltage and the spacecharge region broadens due to capture of avalanche holes on negative iron ions in the π-region. It is demonstrated by comparing the results of numerical calculation with the experimental data that the S-shaped I–V characteristic of the diffusion avalanche S-diodes cannot be explained within the previously proposed mechanism of capture of avalanche holes on the deep iron levels.

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I. Prudaev

Tomsk State University

编辑信件的主要联系方式.
Email: funcelab@gmail.com
俄罗斯联邦, Tomsk, 634050

M. Verkholetov

Moscow State Technical University

Email: funcelab@gmail.com
俄罗斯联邦, Moscow, 105005

A. Koroleva

PAO Radiofizika

Email: funcelab@gmail.com
俄罗斯联邦, Moscow, 125480

O. Tolbanov

Tomsk State University

Email: funcelab@gmail.com
俄罗斯联邦, Tomsk, 634050

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