Deposition of silicon–carbon coatings from the plasma of a non-self-sustained arc discharge with a heated cathode
- Autores: Grenadyorov A.1, Oskomov K.1, Solov’ev A.2, Rabotkin S.1
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Afiliações:
- Institute of High Current Electronics
- National Research Tomsk Polytechnical University
- Edição: Volume 61, Nº 5 (2016)
- Páginas: 690-695
- Seção: Plasma
- URL: https://journals.rcsi.science/1063-7842/article/view/197163
- DOI: https://doi.org/10.1134/S106378421605008X
- ID: 197163
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Resumo
Amorphous hydrogenated carbon doped with silicon oxide (a-C:H:Si:O), which is referred to as silicon–carbon coatings in this work, consists of thin amorphous films, which are used as commercial solid lubricants due to their higher stability under extreme environmental conditions as compared to amorphous hydrogenated carbon. The deposition of silicon–carbon coatings from the plasma of a non-self-sustained arc discharge with a heated cathode is considered. Silicon–carbon coatings are deposited using polyphenul methylsiloxane as a precursor at a flow rate of 0.05 mL/min in an argon atmosphere at a pressure of 0.1 Pa. A high-frequency power supply is used to apply a high-frequency bias voltage to a substrate during deposition. After deposition, the mechanical properties of the coatings are studied. The maximum hardness of the coating is 20 GPa at a minimum friction coefficient of 0.16 and a wear rate of 1.3 × 10–5 mm3 N–1 m–1. Energy dispersive analysis shows that the coatings contain a significant content of carbon and oxygen (about 80 and 15%, respectively) and a low content of silicon (about 5%).
Sobre autores
A. Grenadyorov
Institute of High Current Electronics
Autor responsável pela correspondência
Email: 1711Sasha@mail.ru
Rússia, Akademicheskii pr. 4, Tomsk, 634055
K. Oskomov
Institute of High Current Electronics
Email: 1711Sasha@mail.ru
Rússia, Akademicheskii pr. 4, Tomsk, 634055
A. Solov’ev
National Research Tomsk Polytechnical University
Email: 1711Sasha@mail.ru
Rússia, ul. Lenina 30, Tomsk, 634055
S. Rabotkin
Institute of High Current Electronics
Email: 1711Sasha@mail.ru
Rússia, Akademicheskii pr. 4, Tomsk, 634055