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<article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:ali="http://www.niso.org/schemas/ali/1.0/" article-type="research-article" dtd-version="1.2" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">Semiconductors</journal-id><journal-title-group><journal-title xml:lang="en">Semiconductors</journal-title><trans-title-group xml:lang="ru"><trans-title>Semiconductors</trans-title></trans-title-group></journal-title-group><issn publication-format="print">1063-7826</issn><issn publication-format="electronic">1090-6479</issn><publisher><publisher-name xml:lang="en">Физико-технический институт им. А.Ф.Иоффе РАН</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">206929</article-id><article-id pub-id-type="doi">10.1134/S1063782619090252</article-id><article-categories><subj-group subj-group-type="toc-heading"><subject>Xxiii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 11–14, 2019</subject></subj-group><subj-group subj-group-type="article-type"><subject>Research Article</subject></subj-group></article-categories><title-group><article-title xml:lang="en">Numerical Simulation of the Current–Voltage Characteristics of Bilayer Resistive Memory Based on Non-Stoichiometric Metal Oxides</article-title></title-group><contrib-group><contrib contrib-type="author"><name><surname>Umnyagin</surname><given-names>G. M.</given-names></name><address><country country="RU">Russian Federation</country></address><email>Umnyagingm@gmail.com</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name><surname>Degtyarov</surname><given-names>V. E.</given-names></name><address><country country="RU">Russian Federation</country></address><email>Umnyagingm@gmail.com</email><xref ref-type="aff" rid="aff1"/></contrib><contrib contrib-type="author"><name><surname>Obolenskiy</surname><given-names>S. V.</given-names></name><address><country country="RU">Russian Federation</country></address><email>Umnyagingm@gmail.com</email><xref ref-type="aff" rid="aff1"/></contrib></contrib-group><aff id="aff1"><institution>Lobachevsky State University of Nizhny Novgorod</institution></aff><pub-date date-type="pub" iso-8601-date="2019-09-01" publication-format="electronic"><day>01</day><month>09</month><year>2019</year></pub-date><volume>53</volume><issue>9</issue><fpage>1246</fpage><lpage>1248</lpage><history><date date-type="received" iso-8601-date="2023-12-23"><day>23</day><month>12</month><year>2023</year></date></history><permissions><copyright-statement xml:lang="en">Copyright ©; 2019, Pleiades Publishing, Ltd.</copyright-statement><copyright-year>2019</copyright-year><copyright-holder xml:lang="en">Pleiades Publishing, Ltd.</copyright-holder></permissions><self-uri xlink:href="https://journals.rcsi.science/1063-7826/article/view/206929">https://journals.rcsi.science/1063-7826/article/view/206929</self-uri><abstract xml:lang="en"><p><ext-link><!-- named anchor --></ext-link></p><p id="idm45257554317520">The current–voltage characteristics of a resistive-memory structure based on non-stoichiometric tantalum oxides is numerically simulated. The results of pulsed studies of structures with different shapes of the conductive filament, such as a truncated cone with different generatrix inclination angles, are presented. It is shown how the shape and total volume of the conductive filament affects the current amplitude and the number of pulses necessary for complete filament breaking and restoration.</p></abstract><kwd-group xml:lang="en"><kwd>resistive memory</kwd><kwd>non-stoichiometric</kwd><kwd>numerical simulation</kwd></kwd-group></article-meta></front><body></body><back><ref-list/></back></article>
