作者的详细信息
Dunaev, A. V.
期 | 栏目 | 标题 | 文件 |
卷 44, 编号 4 (2018) | Plasma−Surface Interaction | Study of Gallium Arsenide Etching in a DC Discharge in Low-Pressure HCl-Containing Mixtures | |
卷 45, 编号 11 (2019) | Plasma Diagnostics | Electrophysical Parameters of an Atmospheric-Pressure Gas Discharge over a Potassium Dichromate Solution |