Ar + H2 Plasma Interacting with Lithium-Filled Capillary Porous Structure

Аннотация

Ar + H₂ plasma interacting with liquid lithium was carried out on a one-cathode linear plasma device (SCU-PSI). The lithium sample was covered with capillary porous structure (CPS). It is found that the electron temperature of applied plasma ranged from ~0–1 eV and electron density ranged from 0.1 × 10²⁰ to 1 × 10²⁰ m⁻³. The experimental results indicate that a reduction in the electron temperature and the lithium evaporation is found as the percentage of H₂ increases When the ratio of argon and hydrogen keeps constant, the electron temperature and lithium evaporation increase with applied input power, respectively. The retention of hydrogen atoms in lithium surface results in reducing the lithium evaporation. The XRD analysis result shows that during plasma radiation no LiH is formed.