Penning plasma based simultaneous light emission source of visible and VUV lights


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In this paper, a laboratory-based penning plasma discharge source is reported which has been developed in two anode configurations and is able to produce visible and VUV lights simultaneously. The developed source has simultaneous diagnostics facility using Langmuir probe and optical emission spectroscopy. The two anode configurations, namely, double ring and rectangular configurations, have been studied and compared for optimum use of the geometry for efficient light emissions and recording. The plasma is produced using helium gas and admixture of three noble gases including helium, neon, and argon. The source is capable to produce eight spectral lines for pure helium in the VUV range from 20 to 60 nm and total 24 spectral lines covering the wavelength range 20–106 nm for the admixture of gases. The large range of VUV lines is generated from gaseous admixture rather from the sputtered materials. The recorded spectrum shows that the plasma light radiations in both visible and VUV range are larger in double ring configuration than that of the rectangular configurations at the same discharge operating conditions. To clearly understand the difference, the imaging of the discharge using ICCD camera and particle-in-cell simulation using VORPAL have also been carried out. The effect of ion diffusion, metastable collision with the anode wall and the nonlinear effects are correlated to explain the results.

作者简介

G. Vyas

Manipal University Jaipur; Institute for Plasma Research

编辑信件的主要联系方式.
Email: glvyas27@gmail.com
印度, Jaipur, 303007; Bhat, Gandhinagar, 382428

R. Prakash

Microwave Tubes Division

Email: glvyas27@gmail.com
印度, Pilani, 333031

U. Pal

Microwave Tubes Division

Email: glvyas27@gmail.com
印度, Pilani, 333031

R. Manchanda

Institute for Plasma Research

Email: glvyas27@gmail.com
印度, Bhat, Gandhinagar, 382428

N. Halder

Manipal University Jaipur

Email: glvyas27@gmail.com
印度, Jaipur, 303007

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