Electrooptical effect in the plasmon structure glass–In2O3: Sn–ferroelectric–Al with a subwavelength grating
- Авторы: Blinov L.M.1, Lazarev V.V.1, Yudin S.G.1, Artemov V.V.1, Gorkunov M.V.1, Palto S.P.1
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Учреждения:
- Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
- Выпуск: Том 125, № 3 (2017)
- Страницы: 469-475
- Раздел: Order, Disorder, and Phase Transition in Condensed System
- URL: https://journals.rcsi.science/1063-7761/article/view/192569
- DOI: https://doi.org/10.1134/S1063776117080015
- ID: 192569
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Аннотация
The spectral features of the electrooptical effect, in which an applied voltage changes the refractive index of a ferroelectric copolymer, are studied. Three nanostructures are investigated: two nanostructures play an auxiliary role, and the basic structure consists of a glass substrate, a transparent ITO (In2O3: Sn) layer, active copolymer layer, and an Al layer with a nanograting. This grating with a period of 400 nm meets the conditions of excitation of plasmon resonances. The light transmission coefficients of all structures are analyzed in the spectral range 400–900 nm. The transmission spectra have two characteristic plasmon dips, one of which is related to the copolymer–ITO interface and the other, to the copolymer–Al interface. The aluminum and ITO layers play the role of electrodes, which supply voltage pulses (from 0 to 15 V) to the copolymer layer. When studying the electrooptical effect, we detected spectral shifts in plasmon resonance bands when the amplitudes of both positive and negative voltage pulses (quadratic effect) increase. These shifts change the effective refractive indices (neff) of the structural elements, reaching the minimum negative increment Δeff =–0.06.
Об авторах
L. Blinov
Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
Автор, ответственный за переписку.
Email: lev39blinov@gmail.com
Россия, Leninskii pr. 59, Moscow, 119333
V. Lazarev
Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
Email: lev39blinov@gmail.com
Россия, Leninskii pr. 59, Moscow, 119333
S. Yudin
Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
Email: lev39blinov@gmail.com
Россия, Leninskii pr. 59, Moscow, 119333
V. Artemov
Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
Email: lev39blinov@gmail.com
Россия, Leninskii pr. 59, Moscow, 119333
M. Gorkunov
Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
Email: lev39blinov@gmail.com
Россия, Leninskii pr. 59, Moscow, 119333
S. Palto
Shubnikov Institute of Crystallography, Federal Research Center “Crystallography and Photonics,”
Email: lev39blinov@gmail.com
Россия, Leninskii pr. 59, Moscow, 119333
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