作者的详细信息
Porada, O. K.
| 期 | 栏目 | 标题 | 文件 |
| 卷 38, 编号 4 (2016) | Production, Structure, Properties | Hard plasmachemical a-SiCN coatings | |
| 卷 41, 编号 1 (2019) | Production, Structure, Properties | Plasma-Enhanced CVD Equipment for Deposition of Nanocomposite Nanolayered Films |