Investigation of parameters of inductively coupled plasma and its use in steel nitriding
- Autores: Meshcheryakova E.A.1, Kaziev A.V.1, Zibrov M.S.1, Stepanova T.V.1, Berdnikova M.M.1, Kharkov M.M.1, Pisarev A.A.1
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Afiliações:
- National Research Nuclear University
- Edição: Volume 80, Nº 2 (2016)
- Páginas: 175-179
- Seção: Proceedings of the 22nd International Conference “Ion-Surface Interaction (ISI-2015)”
- URL: https://journals.rcsi.science/1062-8738/article/view/183906
- DOI: https://doi.org/10.3103/S1062873816020192
- ID: 183906
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Resumo
Parameters of inductively coupled plasma (ICP) discharges in a mixture of gases N2, H2, and Ar at a total pressure of 1.5 × 10–3 mbar and a partial pressure ratio N2: H2: Ar = 2: 12: 1 are discussed. The plasma properties are analyzed using Langmuir probes and optical emission spectroscopy. The ICP discharge is used for the nitriding of specimens made of Russian grade 30ChGSA structural steel. The nitriding experiments are performed at different bias voltages Vb in the range of–200 V to +100 V with respect to the walls of the discharge chamber. The surface hardness of the treated specimens depends substantially on the bias voltage, being much higher than the initial value in all cases. The obtained results demonstrate the possibility of increasing the surface hardness up to 1000 HV (4–5 times the initial values) at the bias voltage equal to the floating potential.
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Sobre autores
E. Meshcheryakova
National Research Nuclear University
Autor responsável pela correspondência
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
A. Kaziev
National Research Nuclear University
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
M. Zibrov
National Research Nuclear University
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
T. Stepanova
National Research Nuclear University
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
M. Berdnikova
National Research Nuclear University
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
M. Kharkov
National Research Nuclear University
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
A. Pisarev
National Research Nuclear University
Email: meshchkate@mephist.ru
Rússia, Moscow, 115409
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