Requirements to lasers and formfactor of holograms

详细

The paper analyzes the cross effect of nonuniform exposure nature on hologram field and nonlinearity of holographic material response which significantly adjusts the values of achievable aggregate diffraction efficiency and the optimum exposure. The cross effect is supposed to be registered with the help of a parameter named as a hologram formfactor by analogy with the description of complex body interaction. The technique for calculating formfactor is described. It is shown that the key differences when choosing the optimum exposure can be taken into account with the help of the correction coefficients defined with a hologram formfactor. The calculations for actual Gaussian holograms used in Holographic Memories as well as for model holograms being a good illustration to the dynamics of average diffraction efficiency versus exposure characteristic are made. The Gaussian holograms show good correlation with earlier empirical data.