Effect of Additive DCTA on Electrochemical Tunnel Etching of Aluminum Foil
- Autores: Yuanlong Xiao 1,2, He F.3, Zhang X.3, Xiang Y.3, Yu K.3, Luo X.1, Lyu G.1
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Afiliações:
- Ruyuan Yao Autonomous Dongyangguang Industrial Development Co., Ltd.
- Department of Chemical Engineering, Sichuan University
- Institute of Technology Research and Development of Electronic Materials, Shenzhen Dongyangguang Industrial Development Co., Ltd.
- Edição: Volume 55, Nº 12 (2019)
- Páginas: 1277-1283
- Seção: Article
- URL: https://journals.rcsi.science/1023-1935/article/view/191474
- DOI: https://doi.org/10.1134/S1023193519090131
- ID: 191474
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Resumo
The effect of additive DCTA (1,2-diaminocyclohexane-tetraacetic acid) to HCl + H2SO4 solution on electrochemical tunnel etching behavior of aluminum foil was investigated. The results show that DCTA can activate Al foil surface by decreasing the self-corrosion potential and breakdown potential, which may be attributed to that DCTA forms chelate with dissolved Al3+, thus suppressing the oxide film formation. The tunnel density and effective tunnel number as well as uniformity of tunnel length of etching foil can be increased after DCTA addition. Furthermore, the specific capacitance of etching foil can be enhanced with trace addition of DCTA.
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Sobre autores
Yuanlong Xiao
Ruyuan Yao Autonomous Dongyangguang Industrial Development Co., Ltd.; Department of Chemical Engineering, Sichuan University
Autor responsável pela correspondência
Email: xiaoyuanlong@hecmail.com
República Popular da China, Shaoguan, 512721; Chengdu, 610065
Fengrong He
Institute of Technology Research and Development of Electronic Materials,Shenzhen Dongyangguang Industrial Development Co., Ltd.
Email: xiaoyuanlong@hecmail.com
República Popular da China, Dongguan, 523871
Xia Zhang
Institute of Technology Research and Development of Electronic Materials,Shenzhen Dongyangguang Industrial Development Co., Ltd.
Email: xiaoyuanlong@hecmail.com
República Popular da China, Dongguan, 523871
Yungang Xiang
Institute of Technology Research and Development of Electronic Materials,Shenzhen Dongyangguang Industrial Development Co., Ltd.
Email: xiaoyuanlong@hecmail.com
República Popular da China, Dongguan, 523871
Kai Yu
Institute of Technology Research and Development of Electronic Materials,Shenzhen Dongyangguang Industrial Development Co., Ltd.
Email: xiaoyuanlong@hecmail.com
República Popular da China, Dongguan, 523871
Xiangjun Luo
Ruyuan Yao Autonomous Dongyangguang Industrial Development Co., Ltd.
Email: xiaoyuanlong@hecmail.com
República Popular da China, Shaoguan, 512721
Genpin Lyu
Ruyuan Yao Autonomous Dongyangguang Industrial Development Co., Ltd.
Email: xiaoyuanlong@hecmail.com
República Popular da China, Shaoguan, 512721