Enviar artigo por via de e-mail Determination of Concentration of Organic Contaminants on a Silicon Dioxide Surface by Tribometry
- Autores: Ivliev N.A.1, Kolpakov V.A.1, Krichevskii S.V.1, Kazanskiy N.L.1,2
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Afiliações:
- Samara National Research University
- Institute for Image Processing Systems, Branch of the Crystallography and Photonics Federal Research Center, Russian Academy of Sciences
- Edição: Volume 60, Nº 9 (2017)
- Páginas: 869-873
- Seção: Article
- URL: https://journals.rcsi.science/0543-1972/article/view/246268
- DOI: https://doi.org/10.1007/s11018-017-1285-1
- ID: 246268
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Resumo
Features of the mechanism of pointwise tribometric interaction of silicon dioxide substrates in estimation of the cleanliness of their surfaces are investigated. It is shown that the lower the speed of the probe substrate, the greater the sensitivity of the tribometric system to variations in the concentration of the surface electronic states. Measurement of the acceleration of a probe substrate after it starts to move in the time interval 0 ≤ t ≤ 0.012 sec is suggested. This will make it possible to reduce the error in the degree of cleanliness of surfaces down to 11%.
Sobre autores
N. Ivliev
Samara National Research University
Autor responsável pela correspondência
Email: ivlievn@gmail.com
Rússia, Samara
V. Kolpakov
Samara National Research University
Email: ivlievn@gmail.com
Rússia, Samara
S. Krichevskii
Samara National Research University
Email: ivlievn@gmail.com
Rússia, Samara
N. Kazanskiy
Samara National Research University; Institute for Image Processing Systems, Branch of the Crystallography and Photonics Federal Research Center, Russian Academy of Sciences
Email: ivlievn@gmail.com
Rússia, Samara; Samara
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