Splitting of frequencies of optical phonons in tensile-strained germanium layers


Citar

Texto integral

Acesso aberto Acesso aberto
Acesso é fechado Acesso está concedido
Acesso é fechado Somente assinantes

Resumo

Tensile-strained germanium films in Ge/GeSn/Si/GeSnSi multilayer heterostructures grown by molecularbeam epitaxy on Si(001) substrates are investigated by Raman spectroscopy. Biaxial tensile strains in the films reach 1.5%, which exceeds values previously obtained for this system. Splitting of frequencies of long-wavelength optical phonons is experimentally observed; i.e., the shift of the frequency of the singlet induced by biaxial tensile strains is larger than the shift of the frequency of the doublet in agreement with calculations. The strain-induced shift of Raman scattering peaks from two-phonon scattering in germanium is also detected.

Sobre autores

V. Volodin

Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University

Autor responsável pela correspondência
Email: volodin@isp.nsc.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

V. Timofeev

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: volodin@isp.nsc.ru
Rússia, Novosibirsk, 630090

A. Tuktamyshev

Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University

Email: volodin@isp.nsc.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090

A. Nikiforov

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: volodin@isp.nsc.ru
Rússia, Novosibirsk, 630090

Arquivos suplementares

Arquivos suplementares
Ação
1. JATS XML

Declaração de direitos autorais © Pleiades Publishing, Inc., 2017